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A novel 2D dynamic cellular automata model for photoresist etching process simulation

✍ Scribed by Zhou, Zai-Fa; Huang, Qing-An; Li, Wei-Hua; Lu, Wei


Book ID
121015278
Publisher
Institute of Physics
Year
2005
Tongue
English
Weight
407 KB
Volume
15
Category
Article
ISSN
0960-1317

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