A new nanocomposite resist for low and h
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M. Azam Ali; Kenneth E. Gonsalves; Ankur Agrawal; Augustin Jeyakumar; Clifford L
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Article
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2003
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Elsevier Science
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English
โ 481 KB
A novel nanocomposite photoresist was synthesized and characterized for use in both low and high voltage electron beam lithography. This resist system is shown to display the ideal combination of both enhanced etch resistance and enhanced sensitivity required to satisfy both low and high voltage pat