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A new and low cost lead resistance compensation technique for resistive sensors

โœ Scribed by Tapan Kr. Maiti; Asim Kar


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
286 KB
Volume
43
Category
Article
ISSN
0263-2241

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A novel nanocomposite photoresist was synthesized and characterized for use in both low and high voltage electron beam lithography. This resist system is shown to display the ideal combination of both enhanced etch resistance and enhanced sensitivity required to satisfy both low and high voltage pat