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A modified method for arc deposition of Ti-N thin films

✍ Scribed by J Kourtev; R Pascova; E Weiβmantel


Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
695 KB
Volume
48
Category
Article
ISSN
0042-207X

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Ti-49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystallin