A matrix isolation study of the reactions of OVCl3 with a series of silanes
β Scribed by Nicola Goldberg; Bruce S. Ault
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 130 KB
- Volume
- 787
- Category
- Article
- ISSN
- 0022-2860
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β¦ Synopsis
The reactions between OVCl 3 and a series of silanes have been investigated using matrix isolation infrared spectroscopy. Twin-jet codeposition of the two reagents into argon matrices at 14 K followed by irradiation with light of lO300 nm led to the growth of a number of new bands. These have been assigned to the appropriate silanol species formed by oxygen insertion into the Si-H bond, complexed to VCl 3 . The structures and vibrational frequencies of these complexes have been characterized by high-level theoretical calculations. These calculations also support the relative preference for the insertion reaction compared to other possible pathways.
π SIMILAR VOLUMES
Rate constants for the gas phase reactions of CC1 generated by the flash photolysis of CHBrzCl with a series of silanes have been obtained by kinetic absorption spectroscopy. In general, the rate constants arc very high, and range fmm (4 8 2 0.5) X 10' (SIHH~) to (6-4 r 0.34) % IO9 for SitHe. CC1 do
Water and ethylene form a weak molecular complex in argon matrIces\_ Water is hydrogen-bonded to the m-orbital of ethylene. For the HDO complex, only D-bonding is observed A romplex containing two water molecules and one ethylene has been observed This complex can be described ax a water dimer where