Studies on pour point depression of EVA
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J. W. Qian; G. H. Zhou; W. Y. Yang; Y. L. Xu
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Article
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2001
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John Wiley and Sons
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English
β 184 KB
## Abstract Measurements of the change of the pour point depression (Ξ__T__~__PP__~) were performed for the wax solutions made of four solvent mixtures: ethyl acetate/hexane (EA/HEX), 1,2βdichloroethane/cyclohexane (DCE/CYH), butanone/heptane (MEK/HEP), and acetone/chloroform (AC/CF) doped with EVA