A hierarchically-structured model of information processing in neural networks
β Scribed by M.C. Fairhurst
- Publisher
- Elsevier Science
- Year
- 1978
- Tongue
- English
- Weight
- 580 KB
- Volume
- 9
- Category
- Article
- ISSN
- 0020-7101
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Run-to-run control of a plasma etch process for 8 inch diameter silicon wafers at Digital Semiconductor is determined by maintenance of targeted values of post-etch metrology variables. The post-etch quality variables are extremely sensitive to variation in the etch chamber conditions due to fluctua
## Abstract The emergence of artificial neural network (ANN) technology has provided many promising results in the field of hydrology and water resources simulation. However, one of the major criticisms of ANN hydrologic models is that they do not consider/explain the underlying physical processes