A finite difference model For cMUT devices
β Scribed by Certon, D.; Teston, F.; Patat, F.
- Book ID
- 120612574
- Publisher
- IEEE
- Year
- 2005
- Tongue
- English
- Weight
- 841 KB
- Volume
- 52
- Category
- Article
- ISSN
- 0885-3010
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π SIMILAR VOLUMES
This paper reports on the development of a finite difference model of the sensitization process. The model can be applied to alloy systems in which diffusion of one component to and within the grain boundary determines the rate of precipitation in the boundary. An example application of the model to
The Boltzmann equation describing electron flow in semiconductor devices is considered. The collision operator models the scattering processes between free electrons and phonons in thermal equilibrium. The doping profile and the self-consistent electric field are related by the Poisson equation. The