✦ LIBER ✦

A data-base for IC mask making: N.N. Kundu, S.N. Gupta, A.K. Bagchi, D.R. Nagpal, A.V. Ramani and W.S. Khokle Microelectron. J. 14 (5), 43 (1983)

Book ID: 108361464
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 104 KB
Volume: 18
Category: Article
ISSN: 0026-2692
DOI: 10.1016/s0026-2692(87)80417-2

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A data-base for IC mask making : N. N. K

A data-base for IC mask making : N. N. Kundu, S. N. Gupta, A. K. Bagchi, D. R. Nagpal, A. V. Ramani and W. S. Khokle. Microelectron. J.14 (5), 43 (1983)

📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 132 KB

A data-base for IC mask making

✍ N.N. Kundu; S.N. Gupta; A.K. Bagchi; D.R. Nagpal; A.V. Ramani; S. Khokle 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 456 KB

hotomasks are very important in the manufacturing of integrated circuits and aould be of very high quality with low defect density and very good edge efinition. A photomask fabrication process involves various photo-imaging, rocossing, measurement and quality control steps. The complexity and aphist