โ Scribed by N.N. Kundu; S.N. Gupta; A.K. Bagchi; D.R. Nagpal; A.V. Ramani; S. Khokle
No coin nor oath required. For personal study only.
hotomasks are very important in the manufacturing of integrated circuits and aould be of very high quality with low defect density and very good edge efinition. A photomask fabrication process involves various photo-imaging, rocossing, measurement and quality control steps. The complexity and aphisticetion of the process requires that either the operator be extremely killed and conversant with all the process steps involved as per requirements of given set of masks or that the entire process be computerised. CEERI has developed a data-bese for the complete processing of emulsion and ard surface masks. This has been generated using the IMAGE 1000 software of a IP 1000 computer system and describes each process step such as, exposing ~ith pattern generator, image repeater and contact printer. Several mask ,rocessing procedures, critical dimension measurements and quality contro! taps have also been included. In fact, depending on the job requirements, the ,perator can simply enter all parameters through the query system of the lata-base, which can be conveniently listed either on hard copy or on a terminal or setting up various work stations and process steps of mask making. In this roper, this data-base has been described with its advantages and )racticel usage.
๐ SIMILAR VOLUMES
A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single "pixel" energy distribution. This pixel is then used to write a pattern by controlling th