Nb y O z . Even though the capacitances of laminates were often higher compared to films of constituent materials with similar thickness, considerably higher charge storage factors, Q, were achieved only when tetragonal ZrO 2 was stabilized in ZrO 2 -Ta 2 O 5 laminate and when the laminate thickness
A comprehensive model for theI–Vcharacteristics of metal-Ta2O5/SiO2-Si structures
✍ Scribed by N. Novkovski; E. Atanassova
- Publisher
- Springer
- Year
- 2006
- Tongue
- English
- Weight
- 748 KB
- Volume
- 83
- Category
- Article
- ISSN
- 1432-0630
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📜 SIMILAR VOLUMES
A delta oxide multilayered thin Ðlm is proposed as a new reference material for SIMS depth proÐling. This material is composed of seven thick layers of 18 nm separated by 1 nm delta layers. The surface of Ta 2 O 5 SiO 2 the thin Ðlm was very Ñat and all the interfaces were sharp according to atomic
Za-BPhh: Addition of a solution of iPrC=CH (0.30 mL, 3.0 mmol) in C,H,Br (6 mL) at -30 "C to a stirred mixture of [(C,H,),ZrMe,] (200 mg, 0.80 mmol) and [PhMe2NH][B(4-C,H,F),] (200 mg, 0.39 mmol), followed by warming to 25 'C, resulted in the deposition of a blue microcrystalline solid. Addition of