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A comparison of SiSiO2 interface trap properties in thin-film transistors with thermal and plasma nitrided oxides

✍ Scribed by Jean-Luc Autran; Carole Plossu; Frédéric Seigneur; Bernard Balland; Alain Straboni


Book ID
115990389
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
346 KB
Volume
187
Category
Article
ISSN
0022-3093

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