A comparison of radiation and hot-electron-induced damages in MOS capacitors with rapid thermally nitrided thin-gate oxides

✍ Scribed by A.B. Joshi; G.Q. Lo; D.L. Kwong

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 447 KB
• Volume: 34
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(91)90096-h