A comparison of radiation and hot-electron-induced damages in MOS capacitors with rapid thermally nitrided thin-gate oxides : A. B. Joshi, G. Q. Lo and D. L. Kwong. Solid-St. Electron. 34(10), 1023 (1991)

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 110 KB
• Volume: 32
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(92)90746-8