ChemInform Abstract: Electrochemistry of
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E. A. KNEER; C. RAGHUNATH; S. RAGHAVAN; J. S. JEON
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Article
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2010
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John Wiley and Sons
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Electrochemistry of Chemical Vapor Deposited Tungsten Films with Relevance to Chemical Mechanical Polishing. -The passivation and etching behavior of CVD tungsten films under acidic conditions relevant to chemical mechanical polishing is studied by electrochemical and XPS methods. According to dc p