๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

A comparison of ion beam induced atomic mixing kinetics of Ti/Si, Fe/Si, and Ni/Si systems. In situ electrical resistance and RBS measurements

โœ Scribed by Al-Saleh, K. A. ;Jabr, I. J. ;Saleh, N. S.


Publisher
John Wiley and Sons
Year
1990
Tongue
English
Weight
335 KB
Volume
118
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES