A Comparative Study of Structure and Residual Stress in Chromium Nitride Films Deposited by Vacuum Arc Evaporation, Ion Plating, and DC Magnetron Sputtering

✍ Scribed by Elstner, F. ;Gautier, C. ;Moussaoui, H. ;Piot, O. ;Machet, J.

• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 964 KB
• Volume: 158
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.2211580218