A characterization model for ramp-voltage-stressed I-V characteristics of thin thermal oxides grown on silicon substrate

✍ Scribed by Chiou-Feng Chen; Ching-Yuan Wu

• Book ID: 107856809
• Publisher: Elsevier Science
• Year: 1986
• Tongue: English
• Weight: 877 KB
• Volume: 29
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(86)90106-1