7161. Internal stress of vapour-deposited aluminum films: effect of O2 and water vapour present during film deposition: R Abermann, Thin Solid Films, 186, 1990, 233–240

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 149 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)90968-o