572. Re-emission coefficients of Si and SiO2 films deposited through rf and dc sputtering.: RE Jones et al, J Appl Phys, 38 (12), 1967, 4656–4662

• Publisher: Elsevier Science
• Year: 1968
• Tongue: English
• Weight: 137 KB
• Volume: 18
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(68)91304-3