5377. Displacement criterion for amorphization of silicon during ion implantation: L A Christel et al, J Appl Phys, 52 (12), 1981, 7143–7146

• Book ID: 103467227
• Publisher: Elsevier Science
• Year: 1982
• Tongue: English
• Weight: 153 KB
• Volume: 32
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(82)93973-2