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3D Nanofluidic Channels Shaped by Electron-Beam-Induced Etching

✍ Scribed by John M. Perry; Zachary D. Harms; Stephen C. Jacobson


Book ID
112207831
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
478 KB
Volume
8
Category
Article
ISSN
1613-6810

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πŸ“œ SIMILAR VOLUMES


Electron-beam-induced current and atomic
✍ G. JΓ€ger-Waldau; H.-U. Habermeier; G. Zwicker; E. Bucher πŸ“‚ Article πŸ“… 1994 πŸ› Elsevier Science 🌐 English βš– 278 KB

Reactive ion etching and reactive ion beam etching are common anisotropic etch processes in silicon microdevice fabrication. Unfortunately, they are also known to create electrically active defects in the bulk material. It is possible to detect these active defects with the electron-beam-induced cur