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1.18 Equilibria of silicon nuclei formed during the reduction of SiCl4 by H2 in the preparation of epitaxial silicon films

✍ Scribed by W Riedl

Publisher: Elsevier Science
Year: 1967
Tongue: English
Weight: 175 KB
Volume: 17
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(67)92194-x

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📜 SIMILAR VOLUMES

517. Influence of substrate temperature

517. Influence of substrate temperature and partial pressure of PCl3 on trapping of phosphorus by epitaxial silicon film during the growth process: A S Lyutovich et al, Izv AN UzSSR Ser Fiz Mat Nauk, No 2, 1973, 60–62 (in Russian).

📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 182 KB