ZT thin films produced by metal organic-chemical vapour deposition to be used as high-k dielectrics

✍ Scribed by G Padeletti; A Cusmà; M Viticoli; G.M Ingo; A Mezzi; B Watts

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 604 KB
• Volume: 109
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2003.10.058

✦ Synopsis

In this work the synthesis and characterisation of Zr x Ti 1-x O 2 (ZT) grown via a non conventional MOCVD apparatus on both silicon and platinum coated substrates are described. The samples have been chemically, morphologically and structurally characterised by AFM, XRD, SEM + FEG and XPS. Also high and low frequencies electrical characterisation has been performed to evaluate a possible application of such materials as high-k dielectrics.