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ZnTe nanoparticles formed by ion implantation in a SiO2 layer on silicon

✍ Scribed by R. Chemam; A. Bouabellou; J.J. Grob; D. Muller; G. Schmerber

Book ID: 113822677
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 353 KB
Volume: 216
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2003.11.030

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## Abstract We propose an original approach called “stencil‐masked ion implantation process” to perform a spatially localized synthesis of a limited number of Si nanoparticles (nps) within a thin SiO~2~ layer. This process consists in implanting silicon ions at ultra‐low energy through a stencil ma