We have measured depth profiles of N isotopes by Rutherford backscattering spectrometry (RBS) and nuclear reaction analysis (NRA) before and after implantation of 100 keV N isotopes into Si 3 N 4 films on SiO 2 -glass substrates, which were prepared by using RF-magnetron-reactive-sputtering depositi
XTEM/SAED and SNMS study of film/substrate reactions in Bi2Sr2CaCu2Oy films on Si(100) with Si3N4 buffer layer
✍ Scribed by Dietrich Hesse; Volker Klocke; Andreas Pfau; Gernot Güntherodt; Uwe Breuer; Wolfgang Albrecht; Hans Kurz
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 873 KB
- Volume
- 185-189
- Category
- Article
- ISSN
- 0921-4534
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✦ Synopsis
We have performed cross-sectional TEM/SAED and SNMS studies of film/substrate interactions in Bi2Sr2CaCu20 v ("2212") films on Si(lO0) substrates using Au, SiO 2, and Si3N 4 buffer layers. The 2212 "films were prepared by electron beam evaporation of stoichiometric targets in O 2 of 2x10 -4 mbar and post-annealed in air at 800•850 oc. SNMS depth profiles indicated Si3N 4 layers to be most effective of the buffers studied; they enabled us to grow c-axis oriented 2212 films. These, however, were not superconductive. XTEM and SAED revealed a strong attack on the Si3N 4 buffer layer by solid state reactions resulting in a severe roughness of the initially plane interface. The induced roughness of the interface obviously is responsible for the observed deviations (up to 20 o) of the c-axis of the 2212 grains from the substrate normal, which in turn lead to weak links. The latter then probably inhibit superconductivity.
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