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XPS investigation of aluminum and silicon surfaces nitrided by a distributed electron cyclotron resonance nitrogen plasma

โœ Scribed by N Duez; B Mutel; C Vivien; L Gengembre; P Goudmand; O Dessaux; J Grimblot


Book ID
117215582
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
303 KB
Volume
482-485
Category
Article
ISSN
0039-6028

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## Abstract Microcrystalline silicon films were deposited in a matrix distributed electron cyclotron resonance (MDECR) plasma enhanced chemical vapor deposition (PECVD) system using pure silane, under varying substrate bias conditions. Microstructural characterization of the films shows a lower voi