X-ray triple-axis diffractometry investigation of Si/SiGe/Si on silicon-on-insulator subjected to in situ low-temperature annealing

✍ Scribed by T.D. Ma; H.L. Tu; G.Y. Hu; B.L. Shao; A.S. Liu

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 431 KB
• Volume: 253
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2006.05.127