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X-ray photoelectron study of Te-W-O and Te-W-La-O glasses

โœ Scribed by Yu. A. Teterin; V. I. Nefedov; M. F. Churbanov; A. Yu. Teterin; K. I. Maslakov; E. V. Zorin


Book ID
110166018
Publisher
SP MAIK Nauka/Interperiodica
Year
2007
Tongue
English
Weight
295 KB
Volume
43
Category
Article
ISSN
0020-1685

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This paper describes the characterization by x-ray photoelectron spectroscopy (XPS) of several Ge-doped silica glasses before and after reactive ion etching (ME) in sulphur hexafluoride (SF,). These glasses have been commonly used in the production of optical waveguides, with varying amounts of GeO,