✦ LIBER ✦
X-ray mask making by EBL and Monte Carlo analysis of a single-resist layer process on low-z membrane
✍ Scribed by M. Gentili; A. Lucchesini; P. Lugli; G. Messina; A. Paoletti; S. Santangelo; A. Tucciarone; G. Petrocco
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 774 KB
- Volume
- 9
- Category
- Article
- ISSN
- 0167-9317
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