X-ray characterization of periodic sub-nm surface relief gratings

✍ Scribed by Zaumseil, P. ;Birkholz, M. ;Weidner, G.

• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 357 KB
• Volume: 204
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200675705

✦ Synopsis

Abstract

Line and cross lattices of 260 and 360 nm pitch were prepared by covering p‐doped Si(100) substrates with photoresist, structuring and implanting with 3 × 10^15^ cm^–2^, 45 keV As^+^ ions. These doping lattices with n^+^–p periodicity were investigated by X‐ray diffraction (XRD) and reflectivity (XRR). While XRD did not show any signal of the periodic structure, XRR revealed a clear periodic diffraction pattern related to the pitch of the doping lattice. The features of this pattern as a function of the lattice orientation are discussed in detail for the cross lattice. Atomic force microscopy showed that the measured diffraction pattern is caused by a surface relief grating with sub‐nm amplitude, which was generated by a final doping‐dependent etching step during sample preparation. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)