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Work-function difference between Al and n-GaN from Al-gated n-GaN∕nitrided-thin-Ga[sub 2]O[sub 3]∕SiO[sub 2] metal oxide semiconductor structures

✍ Scribed by Bae, Choelhwyi; Krug, Cristiano; Lucovsky, Gerald; Chakraborty, Arpan; Mishra, Umesh


Book ID
120067459
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
358 KB
Volume
84
Category
Article
ISSN
0003-6951

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