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WO3/TiO2 catalysts: Morphological and structural properties

✍ Scribed by Alemany, L. J. ;Larrubia, M. A. ;Jiménez, M. C. ;Delgado, F. ;Blasco, J. M.


Publisher
Springer
Year
1997
Tongue
English
Weight
327 KB
Volume
60
Category
Article
ISSN
0133-1736

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TiO 2 layers were deposited by reactive pulse magnetron sputtering at a substrate temperature of 400 °C on float glass. The total pressure during the deposition was varied between 0.3 and 3 Pa for modification of the surface morphology. The morphology of 500 nm thick layers was analyzed by AFM and