𝔖 Bobbio Scriptorium
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What is the optimum exposure dose for a positive resist containing poly-functional photoactive compound?

✍ Scribed by Peter Trefonas III; Thomas A. Fisher; Joseph Lachowski


Book ID
103598270
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
451 KB
Volume
13
Category
Article
ISSN
0167-9317

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