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Wet chemical MESA etching of InGaP and GaAs with solutions based on HCl, CH3COOH, and H2O2

✍ Scribed by Gregušová, D. ;Eliáš, P. ;Malacký, L. ;Kúdela, R. ;Škriniarová, J.

Book ID: 105384764
Publisher: John Wiley and Sons
Year: 1995
Tongue: English
Weight: 401 KB
Volume: 151
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2211510113

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