Wavelength sensitivity of the photodegradation of poly(methyl methacrylate)
โ Scribed by Takuya Mitsuoka; Ayako Torikai; Kenji Fueki
- Publisher
- John Wiley and Sons
- Year
- 1993
- Tongue
- English
- Weight
- 366 KB
- Volume
- 47
- Category
- Article
- ISSN
- 0021-8995
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
Poly( methyl methacrylate) (PMMA) was photolyzed with monochromatic light of wavelengths 260, 280, and 300 nm by the use of the Okazaki large spectrograph. The quantum yield of mainchain scission ( aC8), effects of wavelength, and incident photon intensity on the photodegradation were investigated.
The wavelength sensitivity for decrease in percent elongation at break of ethylene carbon monoxide copolymer (ECO) and a low density polyethylene containing a metal compound prooxidant (LDPE/MX) on exposure to a borosilicate-filtered xenon-arc source was determined using a set of sharp cut-on filter