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Wavelength sensitivity of the photodegradation of poly(methyl methacrylate)

โœ Scribed by Takuya Mitsuoka; Ayako Torikai; Kenji Fueki


Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
366 KB
Volume
47
Category
Article
ISSN
0021-8995

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Photodegradation of poly(methyl methacry
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Poly( methyl methacrylate) (PMMA) was photolyzed with monochromatic light of wavelengths 260, 280, and 300 nm by the use of the Okazaki large spectrograph. The quantum yield of mainchain scission ( aC8), effects of wavelength, and incident photon intensity on the photodegradation were investigated.

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The wavelength sensitivity for decrease in percent elongation at break of ethylene carbon monoxide copolymer (ECO) and a low density polyethylene containing a metal compound prooxidant (LDPE/MX) on exposure to a borosilicate-filtered xenon-arc source was determined using a set of sharp cut-on filter