Water-Developable Poly(2-oxazoline)-Based Negative Photoresists

✍ Scribed by Verena Schenk; Lisa Ellmaier; Elisabeth Rossegger; Matthias Edler; Thomas Griesser; Gerald Weidinger; Frank Wiesbrock

• Book ID: 102943193
• Publisher: John Wiley and Sons
• Year: 2012
• Tongue: English
• Weight: 541 KB
• Volume: 33
• Category: Article
• ISSN: 1022-1336
• DOI: 10.1002/marc.201100717

✦ Synopsis

Abstract

Copoly(2‐oxazoline)‐based photoresists are prepared from pEtOx~80~Bu^=^Ox~20~ and pPhOx~80~Dc^=^Ox~20~, respectively, a tetrathiol, and a photosensitive initiator. It is possible to prepare copoly(2‐oxazoline)s bearing unsaturated side chains in a microwave reactor on a decagram scale in reaction times of 100 min or shorter. UV irradiation of dried polymer films through a quartz mask induces the thiol‐ene reaction in the illuminated areas. Subsequent development of the polymer films in halogen‐free solvents reproduces the negative pattern of the mask with a resolution of 2 μm. The pEtOx~80~Bu^=^Ox~20~‐derived photoresists can also be developed in water.