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Wafer level evaluation techniques of electromigration of Al wiring : Hisao Katto and Masami Harada. Proceedings of the 22nd Symposium on Reliability and Maintainability, Tokyo, Japan. Union of Japanese Scientists and Engineers, 31 (June 1992)

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 221 KB
Volume: 33
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(93)90434-z

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