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Wafer flatness testing : Ted C. Bettes. Semiconductor Int., 77 (February 1982)


Book ID
107829685
Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
119 KB
Volume
23
Category
Article
ISSN
0026-2714

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UV exposure, systems and control: Ted. C
๐Ÿ“‚ Article ๐Ÿ“… 1986 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 95 KB

The influence of higher moments is also important for the case of direct implantation of wells for CMOS. Ion equidensity distributions below a window in the mask are shown for boron and arsenic implantation into silicon at energies between 70 ke V and 800 ke V. UV exposure, systems and control TED