Very low surface recombination velocities on 2.5 Ω cm Si wafers, obtained with low-temperature PECVD of Si-oxide and Si-nitride

✍ Scribed by C. Leguijt; P. Lölgen; J.A. Eikelboom; P.H. Amesz; R.A. Steeman; W.C. Sinke; P.M. Sarro; L.A. Verhoef; P.-P. Michiels; Z.H. Chen; A. Rohatgi

• Book ID: 108029178
• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 255 KB
• Volume: 34
• Category: Article
• ISSN: 0927-0248
• DOI: 10.1016/0927-0248(94)90038-8