✦ LIBER ✦
Very Low Leakage Current of High Band-Gap Al$_{2}$O$_{3}$ Stacked on TiO$_{2}$/InP Metal–Oxide–Semiconductor Capacitor with Sulfur and Hydrogen Treatments
✍ Scribed by Yen, Chih-Feng; Lee, Ming-Kwei
- Book ID
- 120388448
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2012
- Tongue
- English
- Weight
- 372 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0021-4922
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