Vertically Stacked Silicon Nanowire Transistors Fabricated by Inductive Plasma Etching and Stress-Limited Oxidation

✍ Scribed by Ng, R.M.Y.; Tao Wang; Feng Liu; Xuan Zuo; Jin He; Mansun Chan

• Book ID: 111963171
• Publisher: IEEE
• Year: 2009
• Tongue: English
• Weight: 392 KB
• Volume: 30
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/led.2009.2014975