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Variable-shaped e-beam lithography enabling process development for future copper damascene technology

✍ Scribed by Philipp Jaschinsky; Jens-Wolfram Erben; Kang-Hoon Choi; Knut Schulze; Manuela Gutsch; Frieder Blaschta; Martin Freitag; Stefan E. Schulz; Katja Steidel; Christoph Hohle; Thomas Gessner; Peter Kuecher


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
787 KB
Volume
88
Category
Article
ISSN
0167-9317

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