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Variable-field hall technique: A new characterization tool for HFET/MODFET device wafers

✍ Scribed by Hans Brugger; Holger Koser


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
788 KB
Volume
8
Category
Article
ISSN
0961-1290

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✦ Synopsis


A selective determination of the carrier density and mobility of a two-dimensional electron or hole gas in HFET or MODFET samples can be performed by measuring the magnetic-fielddependent resistivity and Hall coefficient over a field range of 1 Tesla. This is achieved even in the presence of dominating highly doped caplsupply layers or leaky bufferslsubstrates.

The method works over a wide temperature range between 4K and 300K combined with an outstanding resolution. The measurement and the analysis of data are performed using a powerful numerical algorithm running on a standard PC under MS Windows.