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Vacuum microbalance for determining sputtering yields operable in the vicinity of a magnetically confined, low-pressure arc discharge


Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
170 KB
Volume
26
Category
Article
ISSN
0042-207X

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✦ Synopsis


Classified abstracts

1935-l 941 high bias levels (-2 kV) and at low gas prcssurcs (-IO /cm Hg), is capable of producing a surface free of added impurities.