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Vacuum deposition of films by sputtering using an ion-beam source

✍ Scribed by K.L. Chopra; M.R. Randlett

Publisher: Elsevier Science
Year: 1967
Tongue: English
Weight: 175 KB
Volume: 17
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(67)93168-5

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An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of