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Vacuum depositing of thin films of iron in sealed system at very low pressures

✍ Scribed by V. Kamberský; L. Láska


Book ID
112591886
Publisher
Springer
Year
1965
Tongue
English
Weight
117 KB
Volume
15
Category
Article
ISSN
0011-4626

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Magnetic properties of oxidized iron thi
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Iron thin films have been grown by DC magnetron sputtering using Si(100) wafers as substrates, and then oxidized in a well-controlled oxygen atmosphere in the vacuum chamber. Film thickness is about 50 nm, and grains forming these samples do not exceed 20 nm. In order to control structural propertie