UV-Sensitive polyarylates as photolithographic emulsions

✍ Scribed by Konrad Noniewicz; Zbigniew K. Brzozowski; Irmina Zadrozna

• Book ID: 102654971
• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 845 KB
• Volume: 60
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3

✦ Synopsis

Several UV-sensitive polyarylates based on bisbenzylidenoketones for use as potential photolithographic emulsions were obtained by interfacial polycondensation. The structures of obtained UV-sensitive monomers and polymers were confirmed by infrared, 'H-NMR, and UV spectroscopies. Mechanical and dielectric properties of the obtained polyarylates (including dielectric loss factor, dielectric constant, volume and surface resistivity, and dielectric strength) were evaluated. The investigations show that some of the new polymers obtained in this study may find application as photoresists.