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UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale

✍ Scribed by H. Schmitt; B. Amon; S. Beuer; S. Petersen; M. Rommel; A.J. Bauer; H. Ryssel


Book ID
104052097
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
356 KB
Volume
86
Category
Article
ISSN
0167-9317

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