UV laser modification and selective ion-beam etching of amorphous vanadium pentoxide thin films

✍ Scribed by Cheremisin, Alexander ;Putrolaynen, Vadim ;Velichko, Andrey ;Pergament, Alexander ;Kuldin, Nikolay ;Grishin, Alexander

• Book ID: 105365042
• Publisher: John Wiley and Sons
• Year: 2009
• Tongue: English
• Weight: 322 KB
• Volume: 206
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200824175

✦ Synopsis

Abstract

We present the results on excimer laser modification and patterning of amorphous vanadium pentoxide films. Wet positive resist‐type and Ar ion‐beam negative resist‐type etching techniques were employed to develop UV‐modified films. V~2~O~5~ films were found to possess sufficient resistivity compared to standard electronic materials thus to be promising masks for sub‐micron lithography. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)