UV Laser Deposition of SiS/Poly(thiacarbosilane) Composites and their Conversion to SiO/Poly(thiacarbosiloxane) Composites
✍ Scribed by Radmila Tomovska; Markéta Urbanová; Jan Šubrt; Jaroslav Boháček; Josef Pola
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 328 KB
- Volume
- 208
- Category
- Article
- ISSN
- 1022-1352
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✦ Synopsis
Abstract
ArF laser irradiation of gaseous mixtures of carbon disulfide and silane allows efficient deposition of SiS bond‐containing poly(thiacarbosilanes) incorporating SiS bodies. These SiS/poly(thiacarbosilane) composites are the first example of silicon sulfide/polymer composites. Composite formation is analyzed by GC/MS analysis of volatile products and the structure of the composite as determined by electron microscopy and FT‐IR spectra. The composites undergo reaction with air moisture and methanol vapor, evolve H~2~S and evolve to nano‐sized poly(thiacarbosiloxane)s and poly(methoxythiacarbosiloxane)s.
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